The book is a collection of the author¿s years of experience and research findings, as well as the latest development, in micro-nanofabrication technologies. It gives a detailed introduction on the basics of micro-nanofabrication, including optical lithography, electron beam lithography, focused ion beam technique, X-ray lithography, various etching and replication techniques. For each of the fabrication technology it introduces, the emphasis is on clear explanation of the basic principle, the essential steps in the processes, various process conditions and typical process parameters. The advantages and disadvantages of each technique are also analysed. The applications of micro-nanofabrication technologies focus on manufacturing of very large scale integrated circuits (VLSI), nanoelectronics, optoelectronics, high density magnetic storage, micro-electro-mechanical system or MEMS, biochip or lab-on-chip and nanotechnology. Each of the applications is accompanied by practical examples to demonstrate how particular fabrication techniques are applied. There is an extensive list of references following each chapter for readers to explore further. The book is not only a good supplementary reading material for university undergraduates or postgraduates who are novices in this field, but also a good reference book for experienced engineering professionals who wish to know other fabrication techniques outside their own field.

Hersteller:
Springer Verlag GmbH
juergen.hartmann@springer.com
Tiergartenstr. 17
DE 69121 Heidelberg

Introduction.- Optical Lithography.- Electron Beam Lithography.- X-ray lithography.- Etching technology.- Replication technology.- Applications of micro-nanofabrication technologies.